Product Series:

iStellar-500

Low-energy high-current ion implanters built on a R&D framework of "universal platform + key technology modules", original design, and years of engineering experience; with high current transmission efficiency and an energy range of 0.2-60/80 keV

iStellar-500C

Low-energy high-current cryogenic ion implanters built on the iStellar-500 current system, with low failure rate and high reliability, enabling cryogenic implantation even at -100°C

iStellar-500CIS

High-current ion implanters for CIS applications, built on the mass-validated universal implantation platform and optical system—iStellar; featuring mature and stable performance with excellent metal contamination control, high-precision implantation angle control

iStellar-500HT

Low-energy high-current high-temperature ion implanters built on the iStellar-500 beam system; suitable for advanced processes; enabling high-temperature implantation even at RT (room temperature) of 250°C